直接還原技術(shù)的研究進(jìn)展及發(fā)展趨勢(shì)
2010-12-15 作者：佚名 網(wǎng)友評(píng)論 0 條
直接還原技術(shù)的研究進(jìn)展及發(fā)展趨勢(shì)
劉松利 楊紹麗
攀枝花學(xué)院材料工程學(xué)院
摘要：對(duì)氣基直接還原和煤基直接還原中的各工藝進(jìn)行了系統(tǒng)地介紹和客觀分析，指出了各工藝的特色和優(yōu)點(diǎn)。表明發(fā)展DRI 技術(shù)將有較大的市場(chǎng)需求。轉(zhuǎn)底爐規(guī)?；a(chǎn)尚未到達(dá)成熟的階段，但具有良好的發(fā)展前景。
關(guān)鍵詞：直接還原技術(shù)；DRI；轉(zhuǎn)底爐；發(fā)展趨勢(shì)購買請(qǐng)點(diǎn)擊：訂購申請(qǐng)單
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